Silicon Nitride TEM window Grid

  • Tolerate elevated temperatures, up to 1000C, supporting use in environmental TEMs where dynamic processes are observed at high temperatures
  • Withstand harsh deposition conditions as well as harsh chemical conditions, providing an ideal balance of imaging resolution and mechanical strength
  • Incorporate LPCVD, low-stress (~250 MPa), non-stoichoimetric silicon nitride, providing flat, insulating and hydrophobic surfaces
  • Offer the ability to analyze for oxygen by EDX techniques

 sin-grids offers Silicon Nitride in a variety of square window sizes in addition to our classic two slot format. Silicon Nitride films are available with 20 or 50 nm thickness.

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